SCOPUS 정보 검색 플랫폼

AIP Advances

Volumn 3, Issue 8, 2013, Pages

The resistive switching in TiO2 films studied by conductive atomic force microscopy and Kelvin probe force microscopy

(7) Du, Yuanmin a Kumar, Amit a Pan, Hui b Zeng, Kaiyang a Wang, Shijie c Yang, Ping a Wee, Andrew Thye Shen a

a NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

b INSTITUTE OF HIGH PERFORMANCE COMPUTING (Singapore)

c INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC FIELDS; OXIDE MINERALS; PROBES; TITANIUM DIOXIDE;

CONDUCTIVE ATOMIC FORCE MICROSCOPY; INTEGRATED MODELING; INTERFACIAL EFFECTS; KELVIN PROBE FORCE MICROSCOPY; LOCAL ELECTRIC FIELD; RESISTANCE STATE; RESISTIVE SWITCHING; TIO2 THIN FILMS;

THIN FILMS;

EID: 84883891464 PISSN: None EISSN: 21583226 Source Type: Journal
DOI: 10.1063/1.4818119 Document Type: Article

Times cited : (44)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.