Atomic layer deposition of photoactive CoO/SrTiO3 and CoO/TiO2 on Si(001) for visible light driven photoelectrochemical water oxidation

Journal of Applied Physics

Volumn 114, Issue 8, 2013, Pages

  Ngo, Thong Q ^a   Posadas, Agham ^b   Seo, Hosung ^b   Hoang, Son ^a   McDaniel, Martin D ^a   Utess, Dirk ^c   Triyoso, Dina H ^c   Buddie Mullins, C ^a   Demkov, Alexander A ^b   Ekerdt, John G ^a  

^a The University of Texas at Austin   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^c GLOBALFOUNDRIES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CROSS-SECTIONAL SCANNING; CRYSTALLINE STRUCTURE; ELECTRONIC STRUCTURE CALCULATIONS; LOW GROWTH TEMPERATURE; PHOTOELECTROCHEMICAL WATER OXIDATION; PHOTOELECTROCHEMICALS; VISIBLE-LIGHT-DRIVEN; WATER PHOTO OXIDATIONS;

ALIGNMENT; COBALT; COBALT COMPOUNDS; DEPOSITION; ELECTROCHEMISTRY; ELECTRONIC STRUCTURE; EPITAXIAL FILMS; HETEROJUNCTIONS; MOLECULAR BEAM EPITAXY; OXIDE FILMS; PHOTOELECTRONS; PHOTOOXIDATION; SILICON; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION;

EID: 84883862559     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4819106     Document Type: Article

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