Direct splitting of water under visible light irradiation with an oxide semiconductor photocatalyst

Nature

Volumn 414, Issue 6864, 2001, Pages 625-627

  Zou, Zhigang ^a   Ye, Jinhua ^b   Sayama, Kazuhiro ^a   Arakawa, Hironori ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBOHYDRATES; CATALYSTS; DOPING (ADDITIVES); HYDROGEN FUELS; MOS DEVICES; PHOTOCATALYSIS; RENEWABLE ENERGY RESOURCES; SOLAR ENERGY; ULTRAVIOLET RADIATION;

SURFACE AREA;

WATER;

CARBON DIOXIDE; FUEL; HYDROGEN; INDIUM; NICKEL COMPLEX; OXIDE; OXYGEN; TANTALUM; WATER;

ALTERNATIVE FUEL; HYDROGEN; PHOTOCHEMISTRY; SOLAR POWER; WATER;

ARTICLE; CATALYST; CHEMICAL COMPOSITION; ENERGY TRANSFER; LIGHT; PLANT; PRIORITY JOURNAL; SEMICONDUCTOR; SURFACE PROPERTY; ULTRAVIOLET RADIATION;

EID: 0035818994     PISSN: 00280836     EISSN: None     Source Type: Journal    
DOI: 10.1038/414625a     Document Type: Article

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