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Advanced Materials

Volumn 25, Issue 34, 2013, Pages 4690-4695

Line patterns from cylinder-forming photocleavable block copolymers

(6) Gu, Weiyin a Zhao, Hui b Wei, Qingshuo a,c Coughlin, E Bryan a Theato, Patrick b Russell, Thomas P a

a UNIVERSITY OF MASSACHUSETTS (United States)

b UNIVERSITY OF HAMBURG (Germany)

c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

block copolymers; line patterns; nanotemplates; photocleavable; self assembly

Indexed keywords

ETHYLENE OXIDES; HIGHLY ORDERED ARRAYS; LINE PATTERN; MICRO-DOMAINS; NANOTEMPLATES; PHOTOCLEAVABLE; SELECTIVE REMOVAL; TRENCH PATTERNS;

POLYETHYLENE OXIDES; SCAFFOLDS; SELF ASSEMBLY;

BLOCK COPOLYMERS;

EID: 84883792969 PISSN: 09359648 EISSN: 15214095 Source Type: Journal
DOI: 10.1002/adma.201301556 Document Type: Article

Times cited : (16)

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