Preparation of metallic line patterns from functional block copolymers

Small

Volumn 5, Issue 11, 2009, Pages 1343-1348

  Park, Soojin ^a   Kim, Bokyung ^a   Cirpan, Ali ^a   Russell, Thomas P ^a  

^a UNIVERSITY OF MASSACHUSETTS   (United States)

Author keywords

Block copolymers; Metals; Patterning; Template synthesis; Thin films

Indexed keywords

DIRECT METAL DEPOSITION; FUNCTIONAL BLOCK COPOLYMERS; LIFT-OFF PROCESS; METALLIC LINES; MICRO-DOMAINS; PATTERNING; POLY(2-VINYLPYRIDINE) (P2VP); SOLVENT VAPORS; TEMPLATE SYNTHESIS; TIME EVOLUTIONS;

BLOCK COPOLYMERS; COPOLYMERIZATION; ESTERS; METAL RECOVERY; PLASTIC PRODUCTS; THIN FILMS;

FILM PREPARATION;

NANOMATERIAL; POLY(STYRENE) BLOCK POLY(4 VINYLPYRINDINE) DIBLOCK COPOLYMER; POLY(STYRENE)-BLOCK-POLY(4-VINYLPYRINDINE) DIBLOCK COPOLYMER; POLYMER; POLYSTYRENE DERIVATIVE; POLYVINYL DERIVATIVE;

ARTICLE; CHEMISTRY; METHODOLOGY; NANOTECHNOLOGY; SURFACE PROPERTY;

NANOSTRUCTURES; NANOTECHNOLOGY; POLYMERS; POLYSTYRENES; POLYVINYLS; SURFACE PROPERTIES;

EID: 67649985894     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.200801409     Document Type: Article

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