Wireless wafer-type probe system for measurement of two-dimensional plasma parameters and spatial uniformity

Measurement Science and Technology

Volumn 24, Issue 9, 2013, Pages

  Kim, Jin Yong ^a   Oh, Se Jin ^a   Kim, Young Cheol ^a   Choi, Ik Jin ^a   Chung, Chin Wook ^a  

^a Hanyang University   (South Korea)

Author keywords

plasma diagnostic; plasma parameters; wireless wafer type probe

Indexed keywords

INDUCTIVELY COUPLED PLASMA; IONS; PLASMA DEVICES; PLASMA DIAGNOSTICS; PROBES;

ANTENNA CURRENTS; EXTERNAL CONTROLLER; HARMONIC DETECTION; PLASMA CHAMBERS; PLASMA PARAMETER; PROCESSING PLASMA; SPATIAL UNIFORMITY; TWO-DIMENSIONAL PLASMA;

ELECTRON TEMPERATURE;

EID: 84883177417     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/24/9/095102     Document Type: Article

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