Experimental observation of the transition from nonlocal to local electron kinetics in inductively coupled plasmas

Applied Physics Letters

Volumn 96, Issue 4, 2010, Pages

  Lee, Hyo Chang ^a   Lee, Min Hyong ^a   Chung, Chin Wook ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNA COILS; ELECTRON ENERGIES; ELECTRON ENERGY DISTRIBUTION FUNCTIONS; ELECTRON KINETICS; EXPERIMENTAL OBSERVATION; GAS PRESSURES; HOLLOW SHAPE; NONLOCAL; RADIAL PROFILES; SPATIAL PROFILES; SPATIALLY RESOLVED;

ANTENNAS; DISSOCIATION; ELECTRIC POWER DISTRIBUTION; ELECTRON ENERGY ANALYZERS; ELECTRON ENERGY LEVELS; ELECTRON TEMPERATURE; INDUCTIVELY COUPLED PLASMA; ION BEAMS;

DISTRIBUTION FUNCTIONS;

EID: 75749111302     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3291038     Document Type: Article

References (21)

1. J. Hopwood, Appl. Phys. Lett. APPLAB 0003-6951 62, 940 (1993). 10.1063/1.108526
2. J. H. Keller, J. C. Forster, and M. S. Barnes, J. Vac. Sci. Technol. A JVTAD6 0734-2101 11, 2487 (1993). 10.1116/1.578597
3. M. M. Turner, Phys. Rev. Lett. PRLTAO 0031-9007 71, 1844 (1993). 10.1103/PhysRevLett.71.1844
4. U. Kortshagen, I. Pukropski, and M. Zethoff, J. Appl. Phys. JAPIAU 0021-8979 76, 2048 (1994). 10.1063/1.357674
5. V. A. Godyak and V. I. Kolobov, Phys. Rev. Lett. PRLTAO 0031-9007 81, 369 (1998). 10.1103/PhysRevLett.81.369
6. S. H. Seo, J. I. Hong, and H. Y. Chang, Appl. Phys. Lett. APPLAB 0003-6951 74, 2776 (1999). 10.1063/1.124010
7. C. W. Chung, S. S. Kim, S. H. Seo, and H. Y. Chang, J. Appl. Phys. JAPIAU 0021-8979 88, 1181 (2000). 10.1063/1.373794
8. C. W. Chung and H. Y. Chang, Appl. Phys. Lett. APPLAB 0003-6951 80, 1725 (2002). 10.1063/1.1456263 (Pubitemid 34635874)
9. V. A. Godyak and R. B. Piejak, Appl. Phys. Lett. APPLAB 0003-6951 63, 3137 (1993). 10.1063/1.110227
10. S. H. Seo, C. W. Chung, J. I. Hong, and H. Y. Chang, Phys. Rev. E PLEEE8 1063-651X 62, 7155 (2000). 10.1103/PhysRevE.62.7155 (Pubitemid 32033193)
11. V. A. Godyak, R. Lagushenko, and J. Maya, Phys. Rev. A PLRAAN 1050-2947 38, 2044 (1988). 10.1103/PhysRevA.38.2044
12. M. J. Hartig and M. J. Kushner, J. Appl. Phys. JAPIAU 0021-8979 73, 1080 (1993). 10.1063/1.353295
13. V. I. Kolobov and W. N. G. Hitchon, Phys. Rev. E PLEEE8 1063-651X 52, 972 (1995). 10.1103/PhysRevE.52.972
14. S. J. You and H. Y. Chang, Phys. Plasmas PHPAEN 1070-664X 13, 043503 (2006). 10.1063/1.2171654
15. M. H. Lee and C. W. Chung, Phys. Plasmas PHPAEN 1070-664X 14, 103507 (2007). 10.1063/1.2800852 (Pubitemid 350098051)
16. S. H. Lee, S. J. You, H. Y. Chang, and J. K. Lee, J. Vac. Sci. Technol. A JVTAD6 0734-2101 25, 455 (2007). 10.1116/1.2713408 (Pubitemid 46516387)
17. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, Plasma Sources Sci. Technol. PSTEEU 0963-0252 1, 36 (1992). 10.1088/0963-0252/1/1/006
18. J. I. Fernández Palop, J. Ballesteros, V. Colomer, and M. A. Hernández, Rev. Sci. Instrum. RSINAK 0034-6748 66, 4625 (1995). 10.1063/1.1145300
19. M. A. Lieberman and A. J. Lichtenberg, Principle of Plasma Discharges and Materials Processing, 2nd ed. (Wiley, New York, 2004).
20. B. Ramamurthi, D. J. Economou, and I. D. Kaganovich, Plasma Sources Sci. Technol. PSTEEU 0963-0252 12, 170 (2003). 10.1088/0963-0252/12/2/308
21. B. Ramamurthi, D. J. Economou, and I. D. Kaganovich, Plasma Sources Sci. Technol. PSTEEU 0963-0252 12, 302 (2003). 10.1088/0963-0252/12/3/302