Experimental measurements of spatial plasma potentials and electron energy distributions in inductively coupled plasma under weakly collisional and nonlocal electron kinetic regimes

Physics of Plasmas

Volumn 19, Issue 3, 2012, Pages

  Lee, Hyo Chang ^a   Chung, Chin Wook ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIPOLAR; BOUNDARY REGIONS; CAPACITIVELY COUPLED PLASMAS; DISCHARGE REGIMES; ELECTRON ENERGY DISTRIBUTION FUNCTIONS; ELECTRON ENERGY DISTRIBUTIONS; ELECTRON KINETICS; EXPERIMENTAL MEASUREMENTS; HIGH-T; KINETIC REGIME; LOW ENERGY ELECTRONS; MAXWELLIAN DISTRIBUTION; MEAN FREE PATH; NONLOCAL; PLASMA POTENTIAL; PRESHEATH; SPATIAL PROFILES;

ELECTRIC DISCHARGES; ELECTRON ENERGY ANALYZERS; ELECTRON TEMPERATURE; ELECTRONS; INDUCTIVELY COUPLED PLASMA; KINETICS; PLASMA SHEATHS;

COLLISIONAL PLASMAS;

EID: 84860484901     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3692768     Document Type: Article

References (15)

1. L. Tonks and I. Langmuir, Phys. Rev. 34, 876 (1929). 10.1103/PhysRev.34. 876
2. D. Bohm, The Characteristics of Electrical Discharges in Magnetic Fields, edited by, A. Guthrie and, R. Wakerling, (McGraw-Hill, New York, 1949).
3. K.-U. Riemann, Phys. Plasmas 4, 4158 (1997). 10.1063/1.872536
4. L. Oksuz and N. Hershkowitz, Phys. Rev. Lett. 89, 145001 (2002). 10.1103/PhysRevLett.89.145001
5. M. A. Lieberman and A. J. Lichtenberg, Principle of Plasma Discharges and Materials Processing, 2nd ed. (Wiley, New York, 2004).
6. F. F. Chen and J. P. Chang, Lecture Notes on Principles of Plasma Processing (Academic, New York, 2003).
7. I. D. Kaganovich, Phys. Plasmas 9, 4788 (2002). 10.1063/1.1515274
8. V. A. Godyak and R. B. Piejak, Appl. Phys. Lett. 63, 3137 (1993). 10.1063/1.110227
9. V. A. Godyak and V. I. Demidov, J. Phys. D: Appl. Phys. 44, 233001 (2011). 10.1088/0022-3727/44/23/233001
10. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, Plasma Sources Sci. Technol. 1, 36 (1992). 10.1088/0963-0252/1/1/006
11. J. I. Fernandez Palop, J. Ballesteros, V. Colomer, and M. A. Hernandez, Rev. Sci. Instrum. 66, 4625 (1995). 10.1063/1.1145300
12. H. C. Lee, M. H. Lee, and C. W. Chung, Appl. Phys. Lett. 96, 041503 (2010). 10.1063/1.3291038
13. V. A. Godyak, V. P. Meytlis, and H. R. Strauss, IEEE Trans. Plasma Sci. 23, 728 (1995). 10.1109/27.467995
14. H. C. Lee, M. H. Lee, and C. W. Chung, Appl. Phys. Lett. 96, 071501 (2010). 10.1063/1.3293295
15. I. A. Vasil'eva, Teplofizika Vysokikh Temp. 12, 29 (1974); I. A. Vasil'eva, High Temp. 12, 26 (1974).