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Volumn 84, Issue 5, 2013, Pages

Two-dimensional-spatial distribution measurement of electron temperature and plasma density in low temperature plasmas

Author keywords

[No Author keywords available]

Indexed keywords

DISTRIBUTION MEASUREMENT; EXTERNAL CONDITIONS; GAS MIXING RATIO; HIGH-SPEED MULTIPLEXERS; INDUCTIVE DISCHARGES; LOW TEMPERATURE PLASMAS; PLASMA UNIFORMITY; REAL TIME MEASUREMENTS;

EID: 84878918810     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4802673     Document Type: Article
Times cited : (18)

References (23)
  • 3
    • 0003494740 scopus 로고
    • edited by O. Auciello and D. L. Flamm (Academic, San Diego)
    • N. Hershkowitz, Plasma Diagnostics, edited by, O. Auciello, and, D. L. Flamm, (Academic, San Diego, 1989).
    • (1989) Plasma Diagnostics
    • Hershkowitz, N.1
  • 8
    • 84878934984 scopus 로고    scopus 로고
    • U.S. patent, Publication No. US 2009/0215201 A1 (27 August)
    • N. Benjamin and R. Steger, U.S. patent, Publication No. US 2009/0215201 A1 (27 August 2009).
    • (2009)
    • Benjamin, N.1    Steger, R.2
  • 9
    • 18744393710 scopus 로고    scopus 로고
    • An on-wafer probe array for measuring two-dimensional ion flux distributions in plasma reactors
    • DOI 10.1063/1.1502445
    • T. W. Kim, S. J. Ullal, V. Vahedi, and E. S. Aydil, Rev. Sci. Instrum. 73, 3494 (2002). 10.1063/1.1502445 (Pubitemid 35328725)
    • (2002) Review of Scientific Instruments , vol.73 , Issue.10 , pp. 3494
    • Kim, T.W.1    Ullal, S.J.2    Vahedi, V.3    Aydil, E.S.4
  • 11
    • 0036478133 scopus 로고    scopus 로고
    • Spatial and temporal variation of the ion flux impinging on the wafer surface in presence of a plasma instability
    • DOI 10.1109/TPS.2002.1003953, PII S0093381302033131
    • T. W. Kim and E. S. Aydil, IEEE Trans. Plasma Sci. 30, 120 (2002). 10.1109/TPS.2002.1003953 (Pubitemid 34719691)
    • (2002) IEEE Transactions on Plasma Science , vol.30 , Issue.1 , pp. 120-121
    • Kim, T.W.1    Aydil, E.S.2
  • 14
    • 33847109747 scopus 로고    scopus 로고
    • Floating probe for electron temperature and ion density measurement applicable to processing plasmas
    • DOI 10.1063/1.2204352
    • M. H. Lee, S. H. Jang, and C. W. Chung, J. Appl. Phys. 101, 033305 (2007). 10.1063/1.2204352 (Pubitemid 46280833)
    • (2007) Journal of Applied Physics , vol.101 , Issue.3 , pp. 033305
    • Lee, M.-H.1    Jang, S.-H.2    Chung, C.-W.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.