Wafer-scale fabrication of uniform Si nanowire arrays using the Si wafer with UV/Ozone pretreatment

Journal of Nanoparticle Research

Volumn 15, Issue 9, 2013, Pages

  Bai, Fan ^a,b   Li, Meicheng ^a,b   Huang, Rui ^b   Yu, Yue ^b   Gu, Tiansheng ^b   Chen, Zhao ^b   Fan, Huiyang ^b   Jiang, Bing ^b  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b NORTH CHINA ELECTRIC POWER UNIVERSITY   (China)

Author keywords

Self cleaning; Silicon nanowire arrays; Uniformity; UV Ozone; Wafer scale

Indexed keywords

ETCHING; FABRICATION; NANOWIRES; PASSIVATION; SILICA; SILICON OXIDES; SILVER NANOPARTICLES; SIO2 NANOPARTICLES;

SELF CLEANING; SILICON NANOWIRE ARRAYS; UNIFORMITY; UV/OZONE; WAFER SCALE;

SILICON WAFERS;

NANOWIRE; OZONE; SILICON; SILVER NANOPARTICLE;

ARTICLE; CATALYST; CONTACT ANGLE; NANOFABRICATION; PARTICLE SIZE; PRIORITY JOURNAL; PROTON NUCLEAR MAGNETIC RESONANCE; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY; ULTRAVIOLET RADIATION;

EID: 84882512583     PISSN: 13880764     EISSN: 1572896X     Source Type: Journal    
DOI: 10.1007/s11051-013-1915-8     Document Type: Article

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