Use of multifunctional carboxylic acids and hydrogen peroxide to improve surface quality and minimize phosphine evolution during chemical mechanical polishing of indium phosphide surfaces

Industrial and Engineering Chemistry Research

Volumn 52, Issue 31, 2013, Pages 10664-10672

  Matovu, John B ^a,b   Ong, Patrick ^b   Leunissen, Leonardus H A ^b,c   Krishnan, Sitaraman ^a   Babu, S V ^a  

^a Clarkson University   (United States)

^b IMEC   (Belgium)

^c GLOBALFOUNDRIES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATTENUATED TOTAL REFLECTANCE FOURIER TRANSFORM INFRARED SPECTROSCOPY; CHEMICAL DISSOLUTION; CHEMICAL MECHANICAL POLISHING(CMP); GENERATION MECHANISM; MULTIFUNCTIONAL CARBOXYLIC ACIDS; POLISHING SLURRIES; THERMODYNAMIC CALCULATIONS; ZETA POTENTIAL MEASUREMENTS;

CARBOXYLIC ACIDS; CMOS INTEGRATED CIRCUITS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN PEROXIDE; INDIUM; INDIUM PHOSPHIDE; PEROXIDES; PHOSPHORUS COMPOUNDS; PHOTOELECTRONS; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL MECHANICAL POLISHING;

EID: 84881448700     PISSN: 08885885     EISSN: 15205045     Source Type: Journal    
DOI: 10.1021/ie400689q     Document Type: Article

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