Wet chemical cleaning of InP and InGaAs

Solid State Phenomena

Volumn 187, Issue , 2012, Pages 27-31

  Vos, Rita ^a   Arnauts, Sophia ^a   Conard, Thierry ^a   Moussa, Alain ^a   Struyf, Herbert ^a   Mertens, Paul ^a  

^a IMEC   (Belgium)

Author keywords

Etching; III V substrate; InGaAs; InP; Passivation

Indexed keywords

CRYSTALLOGRAPHY; ETCHING; PASSIVATION; SEMICONDUCTOR DEVICE MANUFACTURE; SUBSTRATES; III-V SEMICONDUCTORS; INDIUM PHOSPHIDE; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING INDIUM; SEMICONDUCTING INDIUM GALLIUM ARSENIDE; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR ALLOYS;

ACIDIC HYDROLYSIS; ACIDIC SOLUTIONS; CLEANING SOLUTION; FREE SURFACES; INGAAS; INP; NATIVE OXIDES; RAPID OXIDATION; SEMICONDUCTOR MANUFACTURING; WET CLEANING;

SEMICONDUCTING INDIUM; CHEMICAL CLEANING;

EID: 84860197688     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.187.27     Document Type: Conference Paper

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