Fabrication of transparent CuCrO2:Mg/ZnO p-n junctions prepared by magnetron sputtering on an indium tin oxide glass substrate

Japanese Journal of Applied Physics

Volumn 52, Issue 5 PART 3, 2013, Pages

  Chen, Li Fong ^a   Wang, Yung Po ^b   Chiu, Te Wei ^b   Shih, Wen Ching ^a   Wu, Mu Shiang ^a  

^a TATUNG UNIVERSITY   (Taiwan)

^b NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE STRUCTURE; CURRENT-VOLTAGE RESPONSE; DEPOSITION TEMPERATURES; DIODE CHARACTERISTICS; INDIUM-TIN-OXIDE GLASS SUBSTRATES; OPTICAL TRANSPARENCY; RADIO FREQUENCY MAGNETRON SPUTTERING; TRANSPARENT P-N JUNCTIONS;

DEPOSITION; GLASS; MAGNETRON SPUTTERING; SEMICONDUCTOR JUNCTIONS; SUBSTRATES; TIN;

FILM PREPARATION;

EID: 84881436894     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.7567/JJAP.52.05EC02     Document Type: Conference Paper

References (32)

1. G. J. Exarhos and X. D. Zhou: Thin Solid Films 515 (2007) 7025.
2. K. Ito and T. Nakazawa: Jpn. J. Appl. Phys. 22 (1983) L245.
3. T. Minami, H. Nanto, and S. Takata: Jpn. J. Appl. Phys. 24 (1985) L605.
4. T. Nakada, Y. Ohkubo, N. Murakami, and A. Kunioka: Jpn. J. Appl. Phys. 34 (1995) 3623.
5. T. Minami, H. Sato, H. Nanto, and S. Takata: Jpn. J. Appl. Phys. 24 (1985) L781.
6. T.-H. Hwang, I.-S. Yang, O.-K. Kwon, M.-K. Ryu, C.-W. Byun, C.-S. Hwang, and S.-H. Ko Park: Jpn. J. Appl. Phys. 50 (2011) 03CB06.
7. K. Nomura, A. Takagi, T. Kamiya, H. Ohta, M. Hirano, and H. Hosono: Jpn. J. Appl. Phys. 45 (2006) 4303.
8. T.-H. Chou, K.-Y. Cheng, C.-C. Su, T.-L. Chang, C.-W. Hsieh, and J.-H. Tsai: Int. J. Precis. Eng. Manuf. 11 (2010) 619.
9. C. W. Joo, J. Moon, J. Hwang, J.-H. Han, J.-W. Shin, D.-H. Cho, J. W. Huh, H. Y. Chu, and J.-I. Lee: Jpn. J. Appl. Phys. 51 (2012) 09MH01.
10. T. Osada, K. Akimoto, T. Sato, M. Ikeda, M. Tsubuku, J. Sakata, J. Koyama, T. Serikawa, and S. Yamazaki: Jpn. J. Appl. Phys. 49 (2010) 03CC02.
11. J. Ebisawa and E. Ando: Curr. Opin. Solid State Mater. Sci. 3 (1998) 386.
12. L. C. Gontijo, A. G. Cunha, and P. A. P. Nascente: Mater. Sci. Eng. B 177 (2012) 1783.
13. K. Matsubara, P. Fons, K. Iwata, A. Yamada, K. Sakurai, H. Tampo, and S. Niki: Thin Solid Films 431-432 (2003) 369.
14. Y. Sobajima, H. Muto, Y. Shinohara, C. Sada, A. Matsuda, and H. Okamoto: Jpn. J. Appl. Phys. 51 (2012) 10NB05.
15. S. Lee, J.-H. Lee, S. J. Tark, S. Choi, C. S. Kim, J. C. Lee, W. M. Kim, and D. Kim: Jpn. J. Appl. Phys. 51 (2012) 10NA16.
16. T. Minami, T. Miyata, Y. Ohtani, and Y. Mochizuki: Jpn. J. Appl. Phys. 45 (2006) L409.
17. Y. Y. Kim, B. H. Kong, and H. K. Cho: Jpn. J. Appl. Phys. 48 (2009) 08HK04.
18. T.-W. Chiu, K. Tonooka, and N. Kikuchi: Vacuum 83 (2008) 614.
19. H. Ohta, K. Nomura, H. Hiramatsu, K. Ueda, T. Kamiya, M. Hirano, and H. Hosono: Solid-State Electron. 47 (2003) 2261.
20. H. Ohta, K. Kawamura, M. Orita, M. Hirano, N. Sarukura, and H. Hosono: Appl. Phys. Lett. 77 (2000) 475.
21. A. Nattestad, X. Zhang, U. Bach, and Y.-B. Cheng: J. Photonics Energy 1 (2011) 011103.
22. H. Kawazoe, M. Yasukawa, H. Hyodo, M. Kurita, H. Yanagi, and H. Hosono: Nature 389 (1997) 939.
23. R. L. Hoffman, J. F. Wager, M. K. Jayaraj, and J. Tate: J. Appl. Phys. 90 (2001) 5763.
24. A. N. Banerjee, S. Nandy, C. K. Ghosh, and K. K. Chattopadhyay: Thin Solid Films 515 (2007) 7324.
25. K. Tonooka, H. Bando, and Y. Aiura: Thin Solid Films 445 (2003) 327.
26. T.-W. Chiu, K. Tonooka, and N. Kikuchi: Thin Solid Films 516 (2008) 5941.
27. R. Nagarajan, A. D. Draeseke, A. W. Sleight, and J. Tate: J. Appl. Phys. 89 (2001) 8022.
28. W. Ketir, G. Rekhila, M. Trari, and A. Amrane: J. Environ. Sci. 24 (2012) 2173.
29. K. Matsubara, P. Fons, K. Iwata, A. Yamada, and S. Niki: Thin Solid Films 422 (2002) 176.
30. T. Minami, H. Sato, S. Takata, N. Ogawa, and T. Mouri: Jpn. J. Appl. Phys. 31 (1992) L1106.
31. A. Janotti and C. G. Van De Walle: Rep. Prog. Phys. 72 (2009) 126501.
32. T.-W. Chiu, Y.-C. Yang, A.-C. Yeh, Y.-P. Wang, and Y.-W. Feng: Vacuum 87 (2013) 174.