Fabrication of ZnO and CuCrO2:Mg thin films by pulsed laser deposition with in situ laser annealing and its application to oxide diodes

Thin Solid Films

Volumn 516, Issue 18, 2008, Pages 5941-5947

  Chiu, Te Wei ^a   Tonooka, Kazuhiko ^a   Kikuchi, Naoto ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Laser ablation; Laser irradiation; Oxides; Semiconductors

Indexed keywords

COPPER COMPOUNDS; FILM PREPARATION; IN SITU PROCESSING; LASER ABLATION; MULTILAYER FILMS; PULSE WIDTH MODULATION; PULSED LASER DEPOSITION; ZINC OXIDE;

OXIDE DIODES; REPETITION FREQUENCY; TRANSPARENT SEMICONDUCTOR FILMS;

THIN FILMS;

EID: 44449102841     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.10.067     Document Type: Article

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