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Japanese Journal of Applied Physics

Volumn 52, Issue 5 PART 3, 2013, Pages

Large-area organosilicon film deposition using cyclonic atmospheric pressure glow discharge

(5) Lin, Jin He a Tsai, Ching Yuan a Liu, Wei Ting a Syu, Yu Kai a Huang, Chun a

a YUAN ZE UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE GLOW DISCHARGE; ATMOSPHERIC PRESSURE PLASMAS; FILM CHARACTERIZATIONS; LARGE-AREA DEPOSITION; ORGANOSILICON FILMS; ORGANOSILICON THIN FILMS; RF PLASMA POWER; STATIC CONTACT ANGLE;

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; PHOTOELECTRONS; PLASMA CVD; PLASMA THEORY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; WAVE PLASMA INTERACTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION;

EID: 84881436271 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.7567/JJAP.52.05EA01 Document Type: Conference Paper

Times cited : (9)

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