Low-temperature atmospheric-pressure-plasma jet for thin-film deposition

IEEE Transactions on Plasma Science

Volumn 37, Issue 7 SPEC. ISS. PART 1, 2009, Pages 1127-1128

  Huang, Chun ^a   Hsu, Wen Tung ^b   Liu, Chi Hung ^b   Wu, Shin Yi ^a   Yang, Shih Hsien ^b   Chen, Tai Hung ^b   Wei, Ta Chin ^c  

^a YUAN ZE UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c CHUNG YUAN CHRISTIAN UNIVERSITY   (Taiwan)

Author keywords

Atmospheric pressure plasma jet (APPJ); Plasma applications; Plasma CVD; Plasma devices

Indexed keywords

COATING APPLICATION; ELECTRIC POWER; GASPHASE; HOMOGENEOUS THIN FILM; LOW TEMPERATURE PLASMAS; LOW TEMPERATURES; PLASMA CVD; PLASMA SYSTEMS; THIN-FILM DEPOSITIONS;

ARGON; ATMOSPHERIC TEMPERATURE; CHEMICAL VAPOR DEPOSITION; PLASMA ACCELERATORS; PLASMA JETS; PLASMA THEORY;

PLASMA DEPOSITION;

EID: 67949108229     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2008.2011636     Document Type: Article

References (7)

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