Investigation of atmospheric-pressure plasma deposited SiOx films on polymeric substrates

Thin Solid Films

Volumn 517, Issue 17, 2009, Pages 5141-5145

  Huang, Chun ^a   Liu, Chi Hung ^b   Su, Chun Hsien ^b   Hsu, Wen Tung ^b   Wu, Shin Yi ^a  

^a YUAN ZE UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Hardness; Plasma chemical vapor deposition; Silicon oxide; Surface characteristics; Transparency

Indexed keywords

ATMOSPHERIC PRESSURE PLASMAS; DEPOSITION PARAMETERS; FTIR; LOW POROSITY; NOVEL TECHNIQUES; OPTICAL APPLICATIONS; PLASMA CHEMICAL VAPOR DEPOSITION; POLYCARBONATE SUBSTRATES; POLYMERIC SUBSTRATE; SEM; SURFACE ANALYSIS METHODS; SURFACE CHARACTERISTICS; TETRAETHOXYSILANE; UV REGION; VACUUM CHAMBERS; XPS;

ATMOSPHERIC CHEMISTRY; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLOW DISCHARGES; HARDNESS; PLASMAS; POLYMERS; PUMPING PLANTS; SILICON COMPOUNDS; SILICON OXIDES; SUBSTRATES; SURFACE ANALYSIS; TRANSPARENCY; VACUUM DEPOSITION; VAPORS;

PLASMA DEPOSITION;

EID: 65649105444     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.03.054     Document Type: Article

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