-
1
-
-
0032058331
-
Protection coatings for polycarbonates based on PECVD from organosilicon feeds
-
May/Jun.
-
L. Zajíčková, V. Buršíková, and J. Janča, "Protection coatings for polycarbonates based on PECVD from organosilicon feeds," Vacuum, vol. 50, no. 1/2, pp. 19-21, May/Jun. 1998.
-
(1998)
Vacuum
, vol.50
, Issue.1-2
, pp. 19-21
-
-
Zajíčková, L.1
Buršíková, V.2
Janča, J.3
-
2
-
-
33344458058
-
Hard coatings by plasma CVD on polycarbonate for automotive and optical applications
-
Apr.
-
T. Schmauder, K D. Nauenburg, K. Kruse, and G. Ickes, "Hard coatings by plasma CVD on polycarbonate for automotive and optical applications," Thin Solid Films, vol. 502, no. 1/2, pp. 270-274, Apr. 2006.
-
(2006)
Thin Solid Films
, vol.502
, Issue.1-2
, pp. 270-274
-
-
Schmauder, T.1
Nauenburg, K.D.2
Kruse, K.3
Ickes, G.4
-
3
-
-
0031210411
-
Preparation of transparent water-repellent films by radio-frequency plasma-enhanced chemical vapour deposition
-
A. Hozumi, H. Sekoguchi, N. Kakinoki, and O. Takai, "Preparation of transparent water-repellent films by radio-frequency plasma-enhanced chemical vapour deposition," J. Mater. Sci., vol.32, no.16, pp. 4253- 4259, Aug. 1997. (Pubitemid 127504026)
-
(1997)
Journal of Materials Science
, vol.32
, Issue.16
, pp. 4253-4259
-
-
Hozumi, A.1
Sekoguchi, H.2
Kakinoki, N.3
Takai, O.4
-
4
-
-
0037671265
-
Preparation of hard and ultra water-repellent silicon oxide films by microwave plasma-enhanced CVD at low substrate temperatures
-
Jul
-
Y. Wu, H. Sugimura, Y. Inoue, and O. Takai, "Preparation of hard and ultra water-repellent silicon oxide films by microwave plasma-enhanced CVD at low substrate temperatures," Thin Solid Films, vol. 435, no. 1/2, pp. 161-164, Jul. 2003.
-
(2003)
Thin Solid Films
, vol.435
, Issue.1-2
, pp. 161-164
-
-
Wu, Y.1
Sugimura, H.2
Inoue, Y.3
Takai, O.4
-
5
-
-
34247522927
-
Plasma-treated biomaterials
-
Apr.
-
P. K. Chu, "Plasma-treated biomaterials," IEEE Trans. Plasma Sci., vol.35, no.2, pp. 181-187, Apr. 2007.
-
(2007)
IEEE Trans. Plasma Sci.
, vol.35
, Issue.2
, pp. 181-187
-
-
Chu, P.K.1
-
6
-
-
0031188990
-
Characterization of amorphous SiC:H films deposited from hexamethyldisilazane
-
Jul.
-
M. T. Kim and J. Lee, "Characterization of amorphous SiC:H films deposited from hexamethyldisilazane," Thin Solid Films, vol. 303, no. 1/2, pp. 173-179, Jul. 1997.
-
(1997)
Thin Solid Films
, vol.303
, Issue.1-2
, pp. 173-179
-
-
Kim, M.T.1
Lee, J.2
-
7
-
-
0032046029
-
Deposition of silicon oxinitride films from hexamethyldisilizane (HMDS) by PECVD
-
Apr.
-
R. González-Luna, M. T. Rodrigo, C. Jiménez, and J. M. Martínez- Duart, "Deposition of silicon oxinitride films from hexamethyldisilizane (HMDS) by PECVD," Thin Solid Films, vol. 317, no. 1/2, pp. 347-350, Apr. 1998.
-
(1998)
Thin Solid Films
, vol.317
, Issue.1-2
, pp. 347-350
-
-
González-Luna, R.1
Rodrigo, M.T.2
Jiménez, C.3
Martínez- Duart, J.M.4
-
8
-
-
0037429184
-
Plasmapolymerized silicon organic thin films from HMDSN for capacitive humidity sensors
-
Feb.
-
F. Kraus, S. Cruz, and J. Muller, "Plasmapolymerized silicon organic thin films from HMDSN for capacitive humidity sensors," Sens. Actuators B, Chem., vol.88, no.3, pp. 300-311, Feb. 2003.
-
(2003)
Sens. Actuators B, Chem.
, vol.88
, Issue.3
, pp. 300-311
-
-
Kraus, F.1
Cruz, S.2
Muller, J.3
-
9
-
-
0032306958
-
The atmospheric-pressure plasma jet: A review and comparison to other plasma sources
-
Dec.
-
A. Schütze, J. Y. Jeong, S. E. Babayan, J. Park, G. S. Selwyn, and R. F. Hicks, "The atmospheric-pressure plasma jet: A review and comparison to other plasma sources," IEEE Trans. Plasma Sci., vol.26, no.6, pp. 1685-1694, Dec. 1998.
-
(1998)
IEEE Trans. Plasma Sci.
, vol.26
, Issue.6
, pp. 1685-1694
-
-
Schütze, A.1
Jeong, J.Y.2
Babayan, S.E.3
Park, J.4
Selwyn, G.S.5
Hicks, R.F.6
-
10
-
-
0033730266
-
Generation of large-volume, atmospheric-pressure, nonequilibrium plasmas
-
Feb.
-
E. E. Kunhardt, "Generation of large-volume, atmospheric-pressure, nonequilibrium plasmas," IEEE Trans. Plasma Sci., vol.28, no.1, pp. 189- 200, Feb. 2000.
-
(2000)
IEEE Trans. Plasma Sci.
, vol.28
, Issue.1
, pp. 189-200
-
-
Kunhardt, E.E.1
-
11
-
-
0037272301
-
Nonthermal decontamination of biological media by atmospheric-pressure plasmas: Review, analysis, and prospects
-
Aug.
-
M. Laroussi, "Nonthermal decontamination of biological media by atmospheric-pressure plasmas: Review, analysis, and prospects," IEEE Trans. Plasma Sci., vol.30, no.4, pp. 1409-1415, Aug. 2002.
-
(2002)
IEEE Trans. Plasma Sci.
, vol.30
, Issue.4
, pp. 1409-1415
-
-
Laroussi, M.1
-
12
-
-
18844436463
-
Low-temperature direct current glow discharges at atmospheric pressure
-
Apr.
-
Y. Duan, C. Huang, and Q. S. Yu, "Low-temperature direct current glow discharges at atmospheric pressure," IEEE Trans. Plasma Sci., vol.33, no.2, pp. 328-329, Apr. 2005.
-
(2005)
IEEE Trans. Plasma Sci.
, vol.33
, Issue.2
, pp. 328-329
-
-
Duan, Y.1
Huang, C.2
Yu, Q.S.3
-
13
-
-
33646023666
-
Molar ratio and energy efficiency of DeNOx using an intermittent DBD ammonia radical injection system
-
Apr.
-
K. Yukimura, T. Hiramatsu, H. Murakami, S. Kambara, H. Motiromi, and T. Yamasita, "Molar ratio and energy efficiency of DeNOx using an intermittent DBD ammonia radical injection system," IEEE Trans. Plasma Sci., vol.34, no.2, pp. 235-241, Apr. 2006.
-
(2006)
IEEE Trans. Plasma Sci.
, vol.34
, Issue.2
, pp. 235-241
-
-
Yukimura, K.1
Hiramatsu, T.2
Murakami, H.3
Kambara, S.4
Motiromi, H.5
Yamasita, T.6
-
14
-
-
67949118771
-
Low-temperature cyclonic plasma created at atmospheric pressure
-
Jul.
-
C. Huang, C. H. Liu, S. Y. Wu, T. H. Chen, J. T. Teng, C. H. Su, and C. M. Chen, "Low-temperature cyclonic plasma created at atmospheric pressure," IEEE Trans. Plasma Sci., vol.37, no.1, pp. 1169-1171, Jul. 2009.
-
(2009)
IEEE Trans. Plasma Sci.
, vol.37
, Issue.1
, pp. 1169-1171
-
-
Huang, C.1
Liu, C.H.2
Wu, S.Y.3
Chen, T.H.4
Teng, J.T.5
Su, C.H.6
Chen, C.M.7
-
15
-
-
34047161736
-
Cold plasma brush generated at atmospheric pressure
-
Jan.
-
Y. Duan, C. Huang, and Q. S. Yu, "Cold plasma brush generated at atmospheric pressure," Rev. Sci. Instrum., vol.78, no.1, p. 015 104, Jan. 2007.
-
(2007)
Rev. Sci. Instrum.
, vol.78
, Issue.1
, pp. 015-104
-
-
Duan, Y.1
Huang, C.2
Yu, Q.S.3
-
16
-
-
45449106599
-
Formation of fluorine for abating sulfur hexafluoride in an atmospheric-pressure plasma environment
-
Aug.
-
C. H. Tsai and J. M. Shao, "Formation of fluorine for abating sulfur hexafluoride in an atmospheric-pressure plasma environment," J. Hazard. Mater., vol.157, no.1, pp. 201-206, Aug. 2008.
-
(2008)
J. Hazard. Mater.
, vol.157
, Issue.1
, pp. 201-206
-
-
Tsai, C.H.1
Shao, J.M.2
-
17
-
-
67949108229
-
Low-temperature atmospheric pressure plasma jet for thin film depositions
-
Jul.
-
C. Huang, W. T. Hsu, C. H. Liu, S. Y. Wu, S. H. Yang, T. H. Chen, and T. C.Wei, "Low-temperature atmospheric pressure plasma jet for thin film depositions," IEEE Trans. Plasma Sci., vol.37, no.1, pp. 1127-1128, Jul. 2009.
-
(2009)
IEEE Trans. Plasma Sci.
, vol.37
, Issue.1
, pp. 1127-1128
-
-
Huang, C.1
Hsu, W.T.2
Liu, C.H.3
Wu, S.Y.4
Yang, S.H.5
Chen, T.H.6
Wei, T.C.7
-
19
-
-
33745603257
-
Preparation of a CVD thin film by an atmospheric pressure low temperature surface discharge plasma torch
-
Aug.
-
A. Kuwabara, S. I. Kuroda, and H. Kubota, "Preparation of a CVD thin film by an atmospheric pressure low temperature surface discharge plasma torch," Plasma Sources Sci. Technol., vol.15, no.5, pp. 328-331, Aug. 2006.
-
(2006)
Plasma Sources Sci. Technol.
, vol.15
, Issue.5
, pp. 328-331
-
-
Kuwabara, A.1
Kuroda, S.I.2
Kubota, H.3
-
20
-
-
0032140139
-
Deposition of silicon dioxide films with an atmospheric-pressure plasma jet
-
Aug.
-
S. E. Babayan, J. Y. Jeong, V. J. Tu, J. Park, G. S. Selwyn, and R. F. Hicks, "Deposition of silicon dioxide films with an atmospheric-pressure plasma jet," Plasma Sources Sci. Technol., vol.7, no.3, pp. 286-288, Aug. 1998.
-
(1998)
Plasma Sources Sci. Technol.
, vol.7
, Issue.3
, pp. 286-288
-
-
Babayan, S.E.1
Jeong, J.Y.2
Tu, V.J.3
Park, J.4
Selwyn, G.S.5
Hicks, R.F.6
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