Plasma-deposited SiOxCyHz barrier coatings for organic device encapsulation

Japanese Journal of Applied Physics

Volumn 52, Issue 7 PART 1, 2013, Pages

  Lee, Seunghun ^a   Kang, Yong Jin ^a   Jung, Sunghoon ^a   Kim, Jong Kuk ^a   Kim, Do Geun ^a  

^a Korea Institute of Material Science   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER COATINGS; DEPOSITION PRECURSORS; HEXAMETHYL DISILOXANE; LINEAR PLASMA SOURCES; ORGANIC DEVICES; ORGANIC PHOTOVOLTAIC (OPV); POWER CONVERSION EFFICIENCIES; SILICON CONTENTS;

COATINGS; DEPOSITION; ION BOMBARDMENT; ION SOURCES;

SILICON OXIDES;

EID: 84880991226     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.7567/JJAP.52.076001     Document Type: Article

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