SiOx-based multilayer barrier coatings produced by a single PECVD process

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Patelli, Alessandro ^a   Vezzù, Simone ^a   Zottarel, Lorenzo ^a   Menin, Enrico ^b   Sada, Cinzia ^b   Martucci, Alessandro ^b   Costacurta, Stefano ^a  

^a Associazione CIVEN Nano Fabrication Facility   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

Author keywords

Barrier; Coating; Multilayers; PECVD; Permeability; Polystyrene; Silicon oxide

Indexed keywords

BARRIER; BARRIER COATINGS; GAS BARRIER; HEXAMETHYL DISILOXANE; MULTILAYER BARRIERS; MULTILAYER DEPOSITION PROCESS; MULTILAYER STRUCTURES; NANOMETRES; NUMBER OF LAYERS; ORGANIC/INORGANIC; PUMPING SPEED; SINGLE-STEP; VACUUM PROCESS;

PLASTIC COATINGS; PLASTICS APPLICATIONS; POLYSTYRENES; SILICON COMPOUNDS; SILICON OXIDES;

MULTILAYERS;

EID: 77954913739     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200931703     Document Type: Conference Paper

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