Oxygen plasma functioning of charge carrier density in zinc oxide thin-film transistors

Applied Physics Express

Volumn 6, Issue 7, 2013, Pages

  Chu, Min Ching ^a   Meena, Jagan Singh ^a   Liu, Po Tsun ^a   D Shieh, Han Ping ^a   You, Hsin Chiang ^b   Tu, Yen Wei ^b   Chang, Feng Chih ^a   Ko, Fu Hsiang ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL CHIN YI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR LEVELS; ORDERS OF MAGNITUDE; OXIDE THIN-FILM TRANSISTORS; PLASMA TECHNIQUES; PLASMA-SURFACE INTERACTIONS; THIN-FILM TRANSISTOR (TFTS); THRESHOLD VOLTAGE SHIFTS; TURN-ON VOLTAGES;

CARRIER CONCENTRATION; DEFECT DENSITY; OXYGEN; PLASMA APPLICATIONS; SEMICONDUCTOR DOPING; THIN FILM TRANSISTORS;

ZINC OXIDE;

EID: 84880851548     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.7567/APEX.6.076501     Document Type: Article

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