Oxygen plasma treatment of gate metal in organic thin-film transistors

Applied Physics Letters

Volumn 88, Issue 23, 2006, Pages

  Han, Keon Kook ^a   Lee, S Woon ^a   Lee, Hong H ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; OXYGEN; PLASMA APPLICATIONS; POLYMERS; SEMICONDUCTING ORGANIC COMPOUNDS; THRESHOLD VOLTAGE;

METAL GATE SURFACE; ON-OFF CURRENT RATIO; OXYGEN PLASMA; OXYGEN PLASMA TREATMENT;

THIN FILM TRANSISTORS;

EID: 33745054070     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2205757     Document Type: Article

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