Wet-etch method for patterning metal electrodes directly on amorphous oxide semiconductor films

ECS Solid State Letters

Volumn 1, Issue 5, 2012, Pages

  Zhao, Mingjie ^a   Lan, Linfeng ^a   Xu, Hua ^a   Xu, Miao ^a   Li, Min ^a   Luo, Dongxiang ^a   Wang, Lei ^a   Wen, Shangsheng ^a   Peng, Junbiao ^a  

^a SOUTH CHINA UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS OXIDE SEMICONDUCTOR (AOS); C. THIN FILM TRANSISTOR (TFT); ELECTRICAL STABILITY; ETCH RATES; INDIUM ZINC OXIDES; METAL ELECTRODES; NEGATIVE GATE; SEMICONDUCTOR FILMS;

ELECTRODES; OXIDE FILMS; PHOTORESISTS;

AMORPHOUS FILMS;

EID: 84880516171     PISSN: 21628742     EISSN: 21628750     Source Type: Journal    
DOI: 10.1149/2.002206ssl     Document Type: Article

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