SCOPUS 정보 검색 플랫폼

Volumn 533, Issue , 2013, Pages 43-47

Variable resistor made by repeated steps of epitaxial deposition and lithographic structuring of oxide layers by using wet chemical etchants

(5) Weber, Dieter a Vofély, Róza a,b Chen, Yuehua a,c Mourzina, Yulia a Poppe, Ulrich a

a FORSCHUNGSZENTRUM JÜLICH (Germany)

b TRINITY COLLEGE (United Kingdom)

c XI'AN JIAOTONG UNIVERSITY (China)

Author keywords

Chemical etching; Epitaxy; High field ionic conduction; Lithography; LSMO; Nanoionics; SrRuO3

Indexed keywords

CHEMICAL ETCHING; HIGH-FIELD; LSMO; NANOIONICS; SRRUO3;

CHEMICAL POLISHING; IONIC CONDUCTION; LITHOGRAPHY; MANGANESE OXIDE; RESISTORS;

EPITAXIAL GROWTH;

EID: 84879890033 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2012.11.118 Document Type: Conference Paper

Times cited : (18)

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