The study on the morphology control of silicon etching by ICP

Chinese Journal of Sensors and Actuators

Volumn 24, Issue 2, 2011, Pages 200-203

  Liu, Huan ^a   Zhou, Zhen ^a   Liu, Huilan ^a   Feng, Lishuang ^a   Wang, Kunbo ^a  

^a BEIHANG UNIVERSITY   (China)

Author keywords

Bowing effect; Icp etching; Morphology control; Silicon; Technique parameter

Indexed keywords

EID: 79956335500     PISSN: 10041699     EISSN: None     Source Type: Journal    
DOI: 10.3969/j.issn.1004-1699.2011.02.009     Document Type: Article

References (20)

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