Ultra-low-edge-defect graphene nanoribbons patterned by neutral beam

Carbon

Volumn 61, Issue , 2013, Pages 229-235

  Huang, Chi Hsien ^a   Su, Ching Yuan ^a   Okada, Takeru ^b   Li, Lain Jong ^c   Ho, Kuan I ^a   Li, Pei Wen ^d   Chen, Inn Hao ^d   Chou, Chien ^a   Lai, Chao Sung ^a   Samukawa, Seiji ^b  

^a CHANG GUNG UNIVERSITY   (Taiwan)

^b TOHOKU UNIVERSITY   (Japan)

^c INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES   (Taiwan)

^d NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

E-BEAM LITHOGRAPHY; GRAPHENE NANO-RIBBON; GRAPHENE NANORIBBONS; HIGH CARRIER MOBILITY; NANOELECTRONIC DEVICES; NEUTRAL BEAM ETCHING; TOP-DOWN PROCESS; VERY-LARGE-SCALE INTEGRATION;

DEFECTS; ELECTRON BEAM LITHOGRAPHY; FIELD EFFECT TRANSISTORS; GRAPHENE; PARTICLE BEAMS; PLASMA ETCHING; VAPORS;

NANORIBBONS;

EID: 84879684685     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2013.04.099     Document Type: Article

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