Reduction of plasma-induced damage in SiO2 films during pulse-time-modulated plasma irradiation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 2, 2005, Pages 389-394

  Ishikawa, Yasushi ^a   Okigawa, Mitsuru ^a   Samukawa, Seiji ^a   Yamasaki, Satoshi ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRONS; HIGH ENERGY PHYSICS; RADIATION DAMAGE; THIN FILMS;

HIGH ENERGY ELECTRONS; HIGH-ENERGY ELECTRONS; PULSE-TIME-MODULATED PLASMAS;

SILICA;

EID: 31144461877     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1861033     Document Type: Conference Paper

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