Smooth, aggregate-free self-assembled monolayer deposition of silane coupling agents on silicon dioxide

Langmuir

Volumn 28, Issue 44, 2012, Pages 15513-15520

  Diebold, Roger M ^a,b   Clarke, David R ^a  

^a HARVARD UNIVERSITY   (United States)

^b University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER LAYERS; BARRIER MATERIAL; CRITICAL PARAMETER; OXIDE SUBSTRATES; PERFLUOROPOLYETHERS; RMS ROUGHNESS; SAMS; SEPARATION ABILITY; SILANE COUPLING AGENT; VAPOR PHASE DEPOSITION; WATER CONTACT ANGLE;

CONTACT ANGLE; COUPLING AGENTS; ORGANIC POLYMERS; PHOTOELECTRONS; SELF ASSEMBLED MONOLAYERS; SILICA; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

AGGREGATES;

ETHER DERIVATIVE; FLUOROCARBON; PERFLUOROPOLYETHER; SILANE DERIVATIVE; SILICON DIOXIDE;

ARTICLE; CHEMISTRY; DIFFUSION; SYNTHESIS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIFFUSION; ETHERS; FLUOROCARBONS; PHOTOELECTRON SPECTROSCOPY; SILANES; SILICON DIOXIDE;

EID: 84868521538     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la303377w     Document Type: Article

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