Very hard ZrC thin films grown by pulsed laser deposition

Journal of the European Ceramic Society

Volumn 33, Issue 12, 2013, Pages 2223-2226

  Craciun, V ^a   McCumiskey, E J ^b   Hanna, M ^b   Taylor, C R ^b  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b J Crayton Pruitt Family Department of Biomedical Engineering   (United States)

Author keywords

Hard coatings; Pulsed laser deposition; X ray diffraction; ZrC

Indexed keywords

COMPRESSIVE RESIDUAL STRESS; GRAZING INCIDENCE X-RAY DIFFRACTION; OXYGEN CONCENTRATIONS; PULSED-LASER DEPOSITION TECHNIQUE; SUBSTRATE TEMPERATURE; WILLIAMSON-HALL PLOT; X RAY REFLECTIVITY; ZRC;

AUGER ELECTRON SPECTROSCOPY; CARBIDES; DEPOSITS; HARD COATINGS; HARDNESS; OXYGEN; PHOTOELECTRONS; PULSED LASER DEPOSITION; SUBSTRATES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ZIRCONIUM COMPOUNDS;

EID: 84878438140     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2013.01.001     Document Type: Article

References (34)

1. Toth L.E. Transition metal carbides and nitrides 1971, Academic, New York.
2. Storms E.K. The refractory carbides 1967, Academic, New York.
3. Lengauer W. Transition metal carbides, nitrides and carbonitrides. Handbook of ceramic hard materials 2000, vol. 1. Wiley-VCH, Weinheim.
4. Lewin E., Wilhelmsson O., Jansson U. J Appl Phys 2006, 100:054303.
5. Martinez-Martinez D., Lopez-Cartes C., Fernandez A., Sanchez-Lopez J.C. Thin Solid Films 2009, 517:1662.
6. Chen C.S., Liu C.P. J Non-Cryst Solids 2005, 351:3725.
7. Charbonnier F.M., Mackie W.A., Hartman R.L., Xie T. J Vac Sci Technol 2001, B19:1064.
8. Cockeram B.V., Hollenbeck J.L. Surf Coat Technol 2002, 157:274.
9. Vasudevamurthy G., Knight T.W., Roberts E., Adams E.T.M. J Nucl Mater 2008, 374:241.
10. Chu C.L., Ji H.L., Yin L.H., Pu Y.P., Lin P.H., Chu P.K. Mater Sci Eng C-Mater Biol Appl 2011, 31:423.
11. Andersson M., Urbonaite S., Lewin E., Jansson U. Thin Solid Films 2012, 520:6375-6381.
12. Xie T.B., Mackie W.A., Davis P.R. J Vac Sci Technol 1996, B14:2090-2092.
13. Zhao H., Liu B., Zhang K., Tang C. Nucl Eng Des 2012, 251:443-448.
14. D'Alessio L., Santagata A., Teghil R., Zaccagnino M., Zacardo I., Marotta V., et al. Appl Surf Sci 2000, 168:284-287.
15. Craciun V., Woo J., Craciun D., Singh R.K. Appl Surf Sci 2006, 252:4615-4618.
16. Craciun D., Socol G., Dorcioman G., Stefan N., Bourne G., Craciun V. J Optoelectron Adv Mat 2010, 12:461.
17. Craciun D., Bourne G., Zhang J., Siebein K., Socol G., Dorcioman G., et al. Surf Coat Technol 2011, 205:5493-5496.
18. Craciun D., Socol G., Dorcioman G., Stefan N., Bourne G., Zhang J., Lambers E., Siebein K., Craciun V. Appl Phys A 2012, 10.1007/s00339-012-7224-8.
19. Parratt L.G. Phys Rev 1954, 95:359.
20. Ma C.-H., Huang J.-H., Chen H. Thin Solid Films 2002, 73-78.
21. Moreno C.M., Sanchez J.M., Ardilla L.C., Molina Aldareguia J.M. Thin Solid Films 2009, 518:206-212.
22. Williamson G.K., Hall W.H. Acta Metall 1953, 1:22-31.
23. Craciun D., Stefan N., Socol G., Dorcioman G., McCumiskey E.J., Hanna M., et al. Appl Surf Sci 2012, 260:2-6.
24. Oliver W.C., Pharr G.M. J Mater Res 1992, 47:1564.
25. D'Heurle F.M. Metall Mater Trans 1970, 1:725-732.
26. Patsalas P., Gravalidis C., Logothetidis S. J Appl Phys 2004, 96:6234-6246.
27. Perea A., Gonzalo J., Budtz-Jorgensen C., Epurescu G., Siegel J., Afonso C.N., et al. J Appl Phys 2008, 104. Article Number: 084912.
28. JCPDS-International Center for Diffraction Data Copyright © JCPDS-ICDD 1996, card 35-0784.
29. Chen C.S., Liu C.P., Tsao C.Y.A. Thin Solid Films 2005, 479:130-136.
30. Ma C.-H., Huang J.-H., Chen H. Surf Coat Technol 2006, 200:3868-3875.
31. Matsuoka M., Isotani S., Sucasaire W., Kuratani N., Ogata K. Surf Coat Technol 2008, 202:3129-3155.
32. Nino A., Tanaka A., Sugiyama S., Taimatsu H. Mater Trans 2010, 51:1621-1626.
33. Ferro D., Teghil R., Barinov S.M., D'Alessio L., DeMaria G. Mater Chem Phys 2004, 87:233-236.
34. Yamakov V., Wolf D., Phillpot S.R., Gleiter H. Acta Mater 2002, 50:61.