High quality ZrC, ZrC/ZrN and ZrC/TiN thin films grown by pulsed laser deposition

Journal of Optoelectronics and Advanced Materials

Volumn 12, Issue 3, 2010, Pages 461-465

  Craciun, D ^a   Socol, G ^a   Dorcioman, G ^a   Stefan, N ^a   Bourne, G ^b   Craciun, V ^a,b  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b J Crayton Pruitt Family Department of Biomedical Engineering   (United States)

Author keywords

Laser ablation; Nanoindentation; TiN; ZrC; ZrN

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; EXCIMER LASERS; FILM PREPARATION; HARDNESS; LASER ABLATION; MORPHOLOGY; MULTILAYER FILMS; NANOINDENTATION; PULSED LASER DEPOSITION; PULSED LASERS; SUBSTRATES; SURFACE MORPHOLOGY; THIN FILMS; TIN; TITANIUM NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

AR ION SPUTTERING; AUGER ELECTRON SPECTROSCOPIES (AES); ELEMENTAL COMPOSITIONS; KRF EXCIMER LASER; OXYGEN CONCENTRATIONS; SUBSTRATE TEMPERATURE; X RAY REFLECTIVITY; X-RAY DIFFRACTION INVESTIGATIONS;

ZIRCONIUM COMPOUNDS;

EID: 77950666862     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (25)

1. C. M. Hollabaugh, L. A. Wahman, R. D. Reiswig, R.W. White, P. Wagner, Nucl. Technol. 35, 527 (1997).
2. F. M. Charbonnier, W. A. Mackie, R. L. Hartman, T. Xie, J. Vac. Sci. Technol. B19, 1064 (2001).
3. T. Xie, W.A. Mackie, P.R. Davis, J. Vac. Sci. Technol. B14, 2090 (1996).
4. R. Ganter, R. Bakker, C. Gough, S. C. Leemann, M. Paraliev, M. Pedrozzi, F. Le Pimpec, V. Schlott, L. Rivkin, A. Wrulich, Phys. Rev. Lett. 100, 064801 (2008).
5. J. A. Glass, N. Palmasiano, R.E. Welsh, in: Properties and Processing of Vapor-Deposited Coatings, M. Pickering, B.W. Sheldon, W.Y. Lee, R.N. Johnson (Eds), Materials Research Society Symposium Proceeding 555, 185 (1999).
6. B. V. Cockeram, J. L. Hollenbeck, Surf. Coat. Technol. 157, 274 (2002).
7. Y. S. Won, Y. S. Kim, V. G. Varanasi, O. Kryliouk, T. J. Anderson, C. T. Sirimanne, L. McElwee-White, J. Cryst. Growth 304, 324 (2007).
8. H. Li, M. Ding, J. Feng, X. Li, G. Bai, F. Zhang, J. Vac. Sci. Technol. B24, 1436 (2006).
9. J. E. Krzanowski, J. Wormwood, Surf. Coat. Technol. 201, 2942 (2006).
10. M. Braic, V. Braic, M. Balaceanu, G. Pavelescu, A. Vladescu, J. Optoelectron. Adv. Mater. 5(5), 1399 (2003).
11. M. Braic, M. Balaceanu, A. Vladescu, A. Kiss, V. Braic, A. Purice, G. Dinescu, N. Scarisoreanu, F. Stokker-Cheregi, A. Moldovan, R. Birjega M. Dinescu, Surface and Coatings Technology, 200( 22-23) 6505 (2006).
12. L. D'Alessio, A. Santagata, R. Teghil, M. Zaccagnino, I. Zaccardo, V. Marotta, D. Ferro, G. De Maria, Appl. Surf. Sci. 168, 284 (2000).
13. D. Ferro, J.V. Rau, V. Rossi Albertini, A. Generosi, R. Teghil, S.M. Barinov. Surface and Coatings Technology 202, 1455 (2008).
14. V. Craciun, J. Woo, D. Craciun, R. K. Singh, Appl. Surf. Sci. 252, 4615 (2006).
15. J. Woo, G. Bourne, V. Craciun, D. Craciun, R. K. Singh, J. Optoelectron. Adv. Mater. 8, 20 (2006).
16. V. Craciun, D. Craciun, J. M. Howard, J. Woo, Thin Solid Films, 515, 4636 (2007).
17. D. Craciun, G. Socol, N. Stefan, G. Bourne, V. Craciun, Appl. Surf. Sci., 255, 5260 (2009).
18. W. C. Oliver, G. M. Pharr, J. Mater. Res., 47, 1564 (1992).
19. JCPDS-International Center for Diffraction Data Copyright © JCPDS-ICDD 1996, card 35-0784 and card 32-1489.
20. G. Abadias, S Dub, R Shmegera, Surface & Coatings Technology, 200, 6538 (2006).
21. Li D. J., Yang J, Zhang X. H., Cao M., J. Vac.Technol. B, 25, L11 (2007).
22. Yu L. H., Dong S. R., Xu J. H., Kojima I., Thin Solid Films 516, 1864 (2008).
23. D. O'Mahony, J. Lunney, T. Dumont, S. Canulescu, T. Lippert, A. Wokaunb, Appl. Surf. Sci., 254, 811 (2007).
24. N. D. Bassim, P. K.Schenck, M. Otani, H. Oguchi Rev. Sci. Instrum, 78, 072203 (2007).
25. H. Kiessig, Ann. Phys., 10, 769 (1931).