Very hard TiN thin films grown by pulsed laser deposition

Applied Surface Science

Volumn 260, Issue , 2012, Pages 2-6

  Craciun, D ^a   Stefan, N ^a   Socol, G ^a   Dorcioman, G ^a   McCumiskey, E ^b   Hanna, M ^b   Taylor, C R ^b   Bourne, G ^c   Lambers, E ^b   Siebein, K ^b   Craciun, V ^a,b  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b UNIVERSITY OF FLORIDA   (United States)

^c Department of Metallurgical and Materials Engineering   (United States)

Author keywords

Hardness; Micro strain; Pulsed laser deposition; Thin films; TiN

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; EXCIMER LASERS; HARDNESS; METALLIC FILMS; PULSE REPETITION RATE; PULSED LASER DEPOSITION; SUBSTRATES; THIN FILMS; TIN; TITANIUM NITRIDE; X RAY DIFFRACTION;

AUGER ELECTRON SPECTROSCOPIES (AES); HARDNESS VALUES; KRF EXCIMER LASER; MICRO-STRAIN; REPETITION RATE; VARIOUS ATMOSPHERE; X RAY REFLECTIVITY; X-RAY DIFFRACTION INVESTIGATIONS;

PULSED LASERS;

EID: 84866736875     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.11.128     Document Type: Conference Paper

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