Direct electron beam patterning of sub-5nm monolayer graphene interconnects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8680, Issue , 2013, Pages

  Qi, Zhengqing John ^a   Rodríguez Manzo, Julio A ^a   Hong, Sung Ju ^a,b   Park, Yung Woo ^b   Stach, Eric A ^c   Drndić, Marija ^a   Johnson, A T Charlie ^a  

^a UNIVERSITY OF PENNSYLVANIA   (United States)

^b Seoul National University   (South Korea)

^c BROOKHAVEN NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITIONS (CVD); D. TRANSMISSION ELECTRON MICROSCOPES (TEM); ELECTRICAL PERFORMANCE; ELECTRON BEAM PATTERNING; FOCUSED ELECTRON BEAMS; HIGH VOLUME MANUFACTURING; MULTI-LAYERED GRAPHENE; PATTERNING TECHNIQUES;

ATOMS; CHEMICAL VAPOR DEPOSITION; COPPER; ELECTRIC PROPERTIES; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FABRICATION; LOGIC DEVICES; MONOLAYERS; PHOTORESISTS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; TRANSPORT PROPERTIES;

GRAPHENE;

EID: 84878392550     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2013724     Document Type: Conference Paper

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