Block copolymer directed self-assembly enables sublithographic patterning for device fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8323, Issue , 2012, Pages

  Wong, H S Philip ^a   Bencher, Chris ^b   Yi, He ^a   Bao, Xin Yu ^a,b   Chang, Li Wen ^a,c  

^a Stanford University   (United States)

^b APPLIED MATERIALS INC   (United States)

^c XILINX INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; LITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

BLOCK COPOLYMER SELF-ASSEMBLY; CIRCUIT FABRICATION; DEVICE FABRICATIONS; DIMENSIONAL CONTROL; DIRECTED SELF-ASSEMBLY; PLACEMENT PROBLEMS; SEMICONDUCTOR INDUSTRY; SEMICONDUCTOR MANUFACTURING;

SELF ASSEMBLY;

EID: 84871890851     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.918312     Document Type: Conference Paper

References (10)

1. C. J. Hawker, T. P. Russell, "Block copolymer lithography: Merging "bottom-up" with "top-down" processes", MRS Bulletin 30, 952-966 (2005).
2. S. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, P. F. Nealey, "Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates," Nature, vol. 424, p. 411 (2005).
3. C. T. Black et al., "Polymer self-assembly in semiconductor microelectronics", IBM Journal of Research and Development 51, 605-633 (2007).
4. Cheng, J. Y., Rettner, C. T., Sanders, D. P., Kim, H.-C. & Hinsberg, W. D. "Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers," Advanced Materials 20, 3155-3158 (2008).
5. L.-W. Chang, X. Bao, C. Bencher, H.-S. P. Wong, "Experimental demonstration of aperiodic patterns of directed self-assembly by block copolymer lithography for random logic circuit layout", IEDM, p. 752 (2010).
6. X. Bao, H. Yi. C. Bencher, L.-W. Chang, H. Dai, Y. Chen, P.-T. J. Chen, and H.-S. P. Wong., "SRAM, NAND, DRAM Contact Hole Patterning using Block Copolymer Directed Self-assembly Guided by Small Topographical Templates", IEDM (2011), paper 7.7, accepted for presentation.
7. 2 6T-SRAM Cell", IEDM, p.625-628 (2008).
8. L.-W. Chang, T.L. Lee, C. H. Wann, C.Y. Chang, and H.-S. P. Wong, "Top-Gated MOSFETs with Diblock Copolymer Self-Assembled 20 nm Contact Holes," IEEE International Electron Devices Meeting (IEDM), pp. 879-882 (2009).
9. H. Yi, X. Bao, J. Zhang, R. Tiberio, J. Conway, L.-W. Chang, S. Mitra, H.-S. P. Wong, "Contact Hole Patterning for Random Logic Circuits using Block Copolymer Directed Self-Assembly," SPIE 2012, submitted.
10. C. Bencher, H. Yi. J. Zhou, M. Cai, H. Dai, J. Smith, L. Miao, J. Cheng, D. Sanders, M. Tjio, S. Holmes, "Directed Self-Assembly Defectivity Assessment," SPIE 2012, submitted.