Combining physical resist modeling and Self-Consistent Field Theory for pattern simulation in directed self-assembly

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8682, Issue , 2013, Pages

  Reilly, Michael ^a   Ginzburg, Valeriy ^b   Smith, Mark D ^c  

^a DSA Product R and D   (United States)

^b DOW CHEMICAL COMPANY   (United States)

^c KLA Tencor Austin   (United States)

Author keywords

DSA; Lithography; Resist simulation; SCFT

Indexed keywords

CYLINDRICAL CONTACTS; DIRECTED SELF-ASSEMBLY; DSA; LITHOGRAPHY SIMULATION; MULTI-SCALE MODELING; RESIST SIMULATION; SCFT; SELF-CONSISTENT-FIELD THEORY;

BLOCK COPOLYMERS; LITHOGRAPHY; MEAN FIELD THEORY; MODELS; MOLECULAR ORBITALS; SELF ASSEMBLY;

POLYMERS;

EID: 84878392413     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2011639     Document Type: Conference Paper

References (22)

1. Gordon S. W. Craig, Paul F. Nealey, "Directed assembly of block copolymers on lithographically defined surfaces", Proc. SPIE. 7637, Alternative Lithographic Technologies II
2. Jing Cheng, Richard A. Lawson, Wei-Ming Yeh, Laren M. Tolbert, Clifford L. Henderson, "Developing directly photodefinable substrate guiding layers for block copolymer directed self-assembly (DSA) patterning", Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
3. C. Mack, Fundamental Principles of Optical Lithography: The Science of Microfabrication. West Sussex, England: John Wiley & Sons (2008).
4. D. G. Flagello, T. Milster, and A. E. Rosenbluth, "Theory of high-NA imaging in homogeneous thin films," J. Opt. Soc. Am. A 13, 53-64 (1996).
5. D. G. Flagello, and T. Milster, "High-numerical-aperture effects in photoresist," Applied Optics, Vol. 36, Issue 34, pp. 8944-8951 (1997).
6. C. Mack, "Development of positive photoresist," J. Electrochemical Soc. 139, 148-152 (1987).
7. Stewart A. Robertson, Michael T. Reilly, Trey Graves, John J. Biafore, Mark D. Smith, Damien Perret, Vladimir Ivin, Sergey Potashov, Mikhail Silakov, Nikolay Elistratov, "Simulation of optical lithography in the presence of topography and spin-coated films", Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI 727340 (March 13, 2009)
8. Stewart A. Robertson ; John J. Biafore ; Mark D. Smith ; Michael T. Reilly ; Jerome Wandel, "Validation of the predictive power of a calibrated physical stochastic resist model", Proc. SPIE 7520, Lithography Asia 2009, 75201N (December 12, 2009);
9. J.A. Sethian, Level Set Methods and Fast Marching Methods: Evolving Interfaces in Computational Geometry, Fluid Mechanics, Computer Vision, and Material Science. Cambridge, England: Cambridge University Press (1999).
10. Matsen, M. W.; Bates, F. S., Unifying weak- and strong-segregation block copolymer theories. Macromolecules 1996, 29 (4), 1091-1098.
11. Fredrickson, G. H.; Ganesan, V.; Drolet, F., Field-theoretic computer simulation methods for polymers and complex fluids. Macromolecules 2002, 35 (1), 16-39.
12. Yang, Y. Z.; Qiu, F.; Zhang, H. D.; Yang, Y. L., Cylindrical phase of diblock copolymers confined in thin films. A real-space self-consistent field theory study. Polymer 2006, 47 (6), 2205-2216.
13. Alexander-Katz, A.; Fredrickson, G. H., Diblock copolymer thin films: A field-theoretic simulation study. Macromolecules 2007, 40 (11), 4075-4087.
14. Li, W. H.; Qiu, F.; Yang, Y. L.; Shi, A. C., Ordering Dynamics of Directed Self-Assembly of Block Copolymers in Periodic Two-Dimensional Fields. Macromolecules 2010, 43 (3), 1644-1650.
15. Mickiewicz, R. A.; Yang, J. K. W.; Hannon, A. F.; Jung, Y. S.; Alexander-Katz, A.; Berggren, K. K.; Ross, C. A., Enhancing the Potential of Block Copolymer Lithography with Polymer Self-Consistent Field Theory Simulations. Macromolecules 2010, 43 (19), 8290-8295
16. Cheng, J. Y.; Sanders, D. P.; Truong, H. D.; Harrer, S.; Friz, A.; Holmes, S.; Colburn, M.; Hinsberg, W. D., Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist. Acs Nano 2010, 4 (8), 4815-4823.
17. Ross, C. A.; Jung, Y. S.; Chuang, V. P.; Ilievski, F.; Yang, J. K. W.; Bita, I.; Thomas, E. L.; Smith, H. I.; Berggren, K. K.; Vancso, G. J.; Cheng, J. Y., Si-containing block copolymers for self-assembled nanolithography. J Vac Sci Technol B 2008, 26 (6), 2489-2494.
18. Ross, C. A.; Cheng, J. Y., Patterned magnetic media made by self-assembled block-copolymer lithography. MRS Bull 2008, 33 (9), 838-845.
19. Cheng, J. Y.; Ross, C. A.; Smith, H. I.; Thomas, E. L., Templated self-assembly of block copolymers: Top-down helps bottom-up. Adv Mater 2006, 18 (19), 2505-2521.
20. Chang, S. W.; Vogel, E.; Ginzburg, V. V.; Murray, D.; Kramer, J. W.; Weinhold, J.; Chuang, V. P.; Sharma, R.; Evans, J.; Landes, B.; Ge, S.; Trefonas, P.; Hustad, P. D., Designing New Materials and Processes for Directed Self-Assembly Applications. Proceedings of SPIE 2012, 8323, 83231M1-83231M9.
21. Mishra, V.; Fredrickson, G. H.; Kramer, E. J., Effect of Film Thickness and Domain Spacing on Defect Densities in Directed Self-Assembly of Cylindrical Morphology Block Copolymers (vol 6, pg 2629, 2012). Acs Nano 2012, 6 (4), 3641-3641.
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