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Volumn 7972, Issue , 2011, Pages
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Developing directly photodefinable substrate guiding layers for block copolymer directed self-assembly (DSA) patterning
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Author keywords
Chemical epitaxy; Photodefinable substrate; Ps b PMMA
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Indexed keywords
COPOLYMER FILMS;
CROSS-LINKABLE;
DIFFERENT SUBSTRATES;
DIRECTED SELF-ASSEMBLY;
GUIDING LAYER;
LITHOGRAPHIC PATTERNS;
LOW MOLECULAR WEIGHT;
MODIFIED SURFACES;
MULTI-STEP;
NEW MATERIAL;
OXYGEN PLASMA EXPOSURE;
PATTERNED SUBSTRATES;
PHASE DOMAIN;
PHOTO-DEFINABLE;
POLY(HYDROXYSTYRENE);
POLYMER RESINS;
PS-B-PMMA;
RELIEF PATTERNS;
SOFT X-RAY;
SUBSTRATE FILMS;
TEMPLATED SURFACE;
THERMAL-ANNEALING;
BLOCK COPOLYMERS;
COPOLYMERIZATION;
EPITAXIAL GROWTH;
MATERIALS;
ORGANIC POLYMERS;
PHASE SEPARATION;
PHOTORESISTS;
PLASTIC COATINGS;
PLASTIC PRODUCTS;
RESINS;
SELF ASSEMBLED MONOLAYERS;
SELF ASSEMBLY;
STYRENE;
SURFACE TREATMENT;
SUBSTRATES;
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EID: 79955905362
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.894702 Document Type: Conference Paper |
Times cited : (8)
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References (10)
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