Structural and optical characteristics of filtered vacuum arc deposited N:TiOx thin films

Thin Solid Films

Volumn 537, Issue , 2013, Pages 28-35

  Cetinorgu Goldenberg, E ^a   Burstein, L ^a   Chayun Zucker, I ^a   Avni, R ^a   Boxman, R L ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

Filtered vacuum arc deposition (FVAD); Microstructure; Optical properties; Titanium oxide

Indexed keywords

DEPOSITION ATMOSPHERE; FILTERED VACUUM ARC DEPOSITION; FILTERED VACUUM ARCS; INTERSTITIAL NITROGEN; NITROGEN-DOPED TITANIUM OXIDES; OPTICAL CHARACTERISTICS; POLYCRYSTALLINE FILM; SUBSTRATE TEMPERATURE;

AMORPHOUS MATERIALS; ATMOSPHERIC TEMPERATURE; DEPOSITS; MICROSTRUCTURE; OPTICAL PROPERTIES; OXYGEN; PHOTOELECTRONS; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; VACUUM APPLICATIONS; VACUUM TECHNOLOGY; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 84878290883     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.04.116     Document Type: Article

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