Fabricating TiO 2 photocatalysts by rf reactive magnetron sputtering at various oxygen partial pressures

Journal of Materials Engineering and Performance

Volumn 20, Issue 6, 2011, Pages 1063-1067

  Lin, W S ^a,b   Kao, L M ^c   Li, W P ^b   Hsu, C Y ^b   Hou, K H ^a  

^a CHANG GUNG UNIVERSITY   (Taiwan)

^b LUNGHWA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^c TUNGNAN UNIVERSITY   (Taiwan)

Author keywords

Oxygen partial pressure; Photocatalyst; Reactive magnetron sputtering; TiO 2 thin film

Indexed keywords

AMORPHOUS STRUCTURES; CRYSTALLINE STRUCTURE; GLASS SUBSTRATES; METHYLENE BLUE; OXYGEN PARTIAL PRESSURE; PHOTO-INDUCED DECOMPOSITION; PHOTOCATALYTIC ACTIVITIES; PHOTOINDUCED HYDROPHILICITY; REACTIVE MAGNETRON SPUTTERING; RF REACTIVE MAGNETRON SPUTTERING; RF-POWER; ROOM TEMPERATURE; SMALL GRAIN SIZE; SPUTTERING DEPOSITION; TARGET TO SUBSTRATE DISTANCE; TIO; TOTAL GAS PRESSURE; XRD PATTERNS;

AMORPHOUS FILMS; DEPOSITION; MAGNETRON SPUTTERING; OXYGEN; PHOTOCATALYSIS; PHOTOCATALYSTS; POSITIVE IONS; SUBSTRATES; SURFACE STRUCTURE; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; VAPOR DEPOSITION;

PARTIAL PRESSURE;

EID: 80052569529     PISSN: 10599495     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11665-010-9726-x     Document Type: Article

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