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Volumn 23, Issue 5, 2013, Pages

Deep and vertical silicon bulk micromachining using metal assisted chemical etching

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING TECHNIQUES; ETCHING PARAMETERS; METAL-ASSISTED CHEMICAL ETCHING; MICROMACHINED STRUCTURES; PHOTORESIST LAYERS; SIDEWALL ROUGHNESS; SILICON BULK MICROMACHINING; SUBSTRATE SURFACE;

EID: 84878094192     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/23/5/055015     Document Type: Article
Times cited : (51)

References (18)
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    • Status and trends of silicon RF technology
    • DOI 10.1016/S0026-2714(00)00198-0
    • Burghartz J N 2001 Microelectron. Reliab. 41 13-9 (Pubitemid 32072141)
    • (2001) Microelectronics Reliability , vol.41 , Issue.1 , pp. 13-19
    • Burghartz, J.N.1
  • 3
    • 13144252240 scopus 로고    scopus 로고
    • Bio-mems: Building up micromuscles
    • DOI 10.1038/nmat1315
    • Spatz J P 2005 Nature Mater. 4 115-6 (Pubitemid 40178706)
    • (2005) Nature Materials , vol.4 , Issue.2 , pp. 115-116
    • Spatz, J.P.1
  • 10
    • 0036571942 scopus 로고    scopus 로고
    • In-plane control of morphology and tunable photoluminescence in porous silicon produced by metal-assisted electroless chemical etching
    • DOI 10.1063/1.1465123
    • Chattopadhyay S, Li X and Bohn P W 2002 J. Appl. Phys. 91 6134 (Pubitemid 34562285)
    • (2002) Journal of Applied Physics , vol.91 , Issue.9 , pp. 6134
    • Chattopadhyay, S.1    Li, X.2    Bohn, P.W.3
  • 15
    • 84863696516 scopus 로고    scopus 로고
    • 10.1088/0957-4484/23/30/305304 0957-4484 305304
    • Balasundaram K et al 2012 Nanotechnology 23 305304
    • (2012) Nanotechnology , vol.23 , Issue.30
    • Balasundaram, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.