The effects of oxygen on controlling the number of carbon layers in the chemical vapor deposition of graphene on a nickel substrate

Nanotechnology

Volumn 24, Issue 18, 2013, Pages

  Dou, Wei Dong ^a,b   Yang, Qingdan ^b   Lee, Chun Sing ^b  

^a SHAOXING UNIVERSITY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON ATOMS; CARBON LAYERS; CHEMICAL VAPOR DEPOSITIONS (CVD); GRAPHENE FILMS; METAL SUBSTRATE; NICKEL SUBSTRATES; SINGLE LAYER; THIN LAYERS;

CHEMICAL VAPOR DEPOSITION; GRAPHENE; NICKEL; OXYGEN; PROPYLENE; VAPORS;

SUBSTRATES;

EID: 84876499657     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/24/18/185603     Document Type: Article

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