Tunable stress and controlled thickness modification in graphene by annealing

ACS Nano

Volumn 2, Issue 5, 2008, Pages 1033-1039

  Ni, Zhen Hua ^a,b   Wang, Hao Min ^b   Ma, Yun ^a   Kasim, Johnson ^a   Wu, Yi Hong ^b   Shen, Ze Xiang ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Annealing; Defects; Graphene; Raman; Stress

Indexed keywords

ANNEALING; ARCHITECTURAL ACOUSTICS; FREQUENCY BANDS; LEAD; SILICON COMPOUNDS; SPECTRUM ANALYSIS; STRESSES;

(ABIOTIC AND BIOTIC) STRESS; (E ,3E) PROCESS; (PL) PROPERTIES; EXPERIMENTAL STUDIES; GRAPHENE; INDUCED DEFECTS; PHONON FREQUENCIES; POTENTIAL APPLICATIONS; RAMAN BANDS;

MOLECULAR BEAM EPITAXY;

GRAPHITE; NANOMATERIAL;

ARTICLE; CHEMISTRY; COMPRESSIVE STRENGTH; CONFORMATION; CRYSTALLIZATION; HARDNESS; HEAT; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; TENSILE STRENGTH; ULTRASTRUCTURE; YOUNG MODULUS;

COMPRESSIVE STRENGTH; CRYSTALLIZATION; ELASTIC MODULUS; GRAPHITE; HARDNESS; HOT TEMPERATURE; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTIES; TENSILE STRENGTH;

EID: 45749119968     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn800031m     Document Type: Article

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