Structural and optical properties of thin In2O3 films produced by autowave oxidation

Semiconductors

Volumn 47, Issue 4, 2013, Pages 569-573

  Tambasov, I A ^a,c   Myagkov, V G ^a   Ivanenko, A A ^a   Nemtsev, I V ^a   Bykova, L E ^a   Bondarenko, G N ^b   Mihlin, J L ^a   Maksimov, I A ^b   Ivanov, V V ^c   Balashov, S V ^c   Karpenko, D S ^c  

^a KIRENSKY INSTITUTE OF PHYSICS   (Russian Federation)

^b INSTITUTE OF CHEMISTRY AND CHEMICAL TECHNOLOGY   (Russian Federation)

^c Academician MF Reshetnev Information Satellite Systems   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84876427951     PISSN: 10637826     EISSN: None     Source Type: Journal    
DOI: 10.1134/S1063782613040210     Document Type: Article

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