Deposition of fluorine doped indium oxide by atmospheric pressure chemical vapour deposition

Thin Solid Films

Volumn 520, Issue 4, 2011, Pages 1242-1245

  Sheel, David W ^a   Gaskell, Jeffrey M ^a  

^a UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

APCVD; Fluorine doped indium oxide; Photovoltaics; Transparent conductive oxide

Indexed keywords

ACETYLACETONATES; APCVD; CHEMICAL VAPOUR DEPOSITION; FLUORINE-DOPED; HIGH THROUGHPUT; INDIUM OXIDE; PHOTOVOLTAICS; SUBSTRATE TEMPERATURE; TRANSPARENT CONDUCTIVE OXIDES; TRIFLUOROACETIC ACIDS; VOLATILE SOLID;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; FLUORINE; INDIUM; THROUGHPUT;

INDIUM COMPOUNDS;

EID: 82755161723     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.206     Document Type: Conference Paper

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