SCOPUS 정보 검색 플랫폼

Volumn 89, Issue 1, 2012, Pages 84-88

Effects of rapid thermal annealing on the properties of In 2O3 thin films grown on glass substrate by rf reactive magnetron sputtering

(1) Cho, Shinho a

a Silla University (South Korea)

Author keywords

Annealing; Indium oxide; Sputtering; Thin film

Indexed keywords

AVERAGE GRAIN SIZE; BAND GAP ENERGY; GLASS SUBSTRATES; INDIUM OXIDE; PREFERRED ORIENTATIONS; REACTIVE MAGNETRON SPUTTERING; RF REACTIVE MAGNETRON SPUTTERING; WAVELENGTH RANGES;

ANNEALING; CARRIER CONCENTRATION; ELECTRIC PROPERTIES; GLASS; INDIUM; RAPID THERMAL ANNEALING; SPUTTERING; SUBSTRATES; THIN FILMS;

OPTICAL PROPERTIES;

EID: 81855194119 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2011.03.147 Document Type: Conference Paper

Times cited : (40)

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