Pulsed laser deposition of ITO thin films and their characteristics

Semiconductors

Volumn 46, Issue 3, 2012, Pages 410-413

  Zuev, D A ^a   Lotin, A A ^a   Novodvorsky, O A ^a   Lebedev, F V ^a   Khramova, O D ^a   Petuhov, I A ^b   Putilin, Ph N ^b   Shatohin, A N ^b   Rumyanzeva, M N ^b   Gaskov, A M ^b  

^a INSTITUTE ON LASER AND INFORMATION TECHNOLOGIES   (Russian Federation)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84858224721     PISSN: 10637826     EISSN: None     Source Type: Journal    
DOI: 10.1134/S1063782612030256     Document Type: Article

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