XPS and AFM studies of surface chemistry and morphology of In 2O3 ultrathin films deposited by rheotaxial growth and vacuum oxidation

Thin Solid Films

Volumn 520, Issue 3, 2011, Pages 927-931

  Koscielniak P ^a   Mazur, J ^a   Henek, J ^a   Kwoka, M ^a,b   Pawela, Ł ^a   Szuber, J ^a  

^a SILESIAN UNIVERSITY OF TECHNOLOGY   (Poland)

^b UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

AFM; In2O3; RGVO; Surface chemistry; Surface morphology; XPS

Indexed keywords

AFM; DEPOSITION PROCESS; NANO LAYERS; OPTIMAL CONDITIONS; RGVO; SI SUBSTRATES; SURFACE COVERAGES; ULTRA-THIN;

INDIUM; MORPHOLOGY; OXIDATION; SURFACE CHEMISTRY; SURFACE MORPHOLOGY; THERMAL EVAPORATION; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

ULTRATHIN FILMS;

EID: 81855213161     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.184     Document Type: Conference Paper

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