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Volumn 13, Issue 1, 2013, Pages 242-249
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Dimensional optimization of nanowire - Complementary metal oxide-semiconductor inverter
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Author keywords
CMOS; Inverter; Nanowire; Transistor
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Indexed keywords
CHANNEL LENGTH;
DIGITAL VOLTAGE;
INVERTER;
METAL OXIDE SEMICONDUCTOR;
NOISE MARGINS;
OXIDE SEMICONDUCTOR;
SILICON NANOWIRE TRANSISTORS;
TRANSFER CHARACTERISTICS;
CMOS INTEGRATED CIRCUITS;
NANOWIRES;
TRANSISTORS;
OPTIMIZATION;
METAL;
NANOMATERIAL;
OXIDE;
ARTICLE;
CHEMISTRY;
COMPUTER AIDED DESIGN;
ELECTRIC CONDUCTIVITY;
EQUIPMENT;
EQUIPMENT DESIGN;
EQUIPMENT FAILURE;
SEMICONDUCTOR;
SIGNAL PROCESSING;
ULTRASTRUCTURE;
COMPUTER-AIDED DESIGN;
ELECTRIC CONDUCTIVITY;
EQUIPMENT DESIGN;
EQUIPMENT FAILURE ANALYSIS;
METALS;
NANOSTRUCTURES;
OXIDES;
SEMICONDUCTORS;
SIGNAL PROCESSING, COMPUTER-ASSISTED;
TRANSISTORS, ELECTRONIC;
MLCS;
MLOWN;
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EID: 84876256845
PISSN: 15334880
EISSN: 15334899
Source Type: Journal
DOI: 10.1166/jnn.2013.6796 Document Type: Article |
Times cited : (7)
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References (18)
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