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Volumn 5, Issue 1, 2012, Pages 93-98

Study and simulation of static characteristics of nanowire inverter with different circuit configurations

Author keywords

CMOS; Inverter; Nanowire; NMOS; Transistor

Indexed keywords


EID: 84865583559     PISSN: 19749821     EISSN: 25331701     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (11)

References (13)
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    • Silicon nanowire circuits fabricated by AFM oxidation nanolithography
    • Ramses V Martínez, Javier Martínez, Ricardo Garcia, Silicon nanowire circuits fabricated by AFM oxidation nanolithography, Nanotechnolog Vol. 21, No. 24, 2009.
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    • Martínez, R.V.1    Martínez, J.2    Garcia, R.3
  • 3
    • 33751401809 scopus 로고    scopus 로고
    • Influence of band-structure on electron ballistic transport in Silicon nanowire MOSFET's: An atomistic study
    • K. Nehari, N. Cavassilas, J. L. Autran, M. Bescond, D. Munteanu, M. Lannoo, Influence of band-structure on electron ballistic transport in Silicon nanowire MOSFET's: an atomistic study, Proc. ESSDERC 2005, p. 229, 2005.
    • (2005) Proc. ESSDERC 2005 , pp. 229
    • Nehari, K.1    Cavassilas, N.2    Autran, J.L.3    Bescond, M.4    Munteanu, D.5    Lannoo, M.6
  • 4
    • 4344606224 scopus 로고    scopus 로고
    • A three-dimensional quantum simulation of silicon nanowire transistors with the effective-mass approximation
    • J. Wang, E. Polizzi, M. S. Lundstrom, A three-dimensional quantum simulation of silicon nanowire transistors with the effective-mass approximation, J. Appl. Phys., vol. 96, p. 2192, 2004.
    • (2004) J. Appl. Phys. , vol.96 , pp. 2192
    • Wang, J.1    Polizzi, E.2    Lundstrom, M.S.3
  • 6
    • 84957893116 scopus 로고    scopus 로고
    • Design Considerations and Comparative Investigation of Ultra-Thin SOI, Double-Gate and Cylindrical Nanowire FETs
    • E. Gnani et al., Design Considerations and Comparative Investigation of Ultra-Thin SOI, Double-Gate and Cylindrical Nanowire FETs, ESSDERC Proceeding, 2006, pp. 371-374.
    • (2006) ESSDERC Proceeding , pp. 371-374
    • Gnani, E.1
  • 7
    • 55649113711 scopus 로고    scopus 로고
    • Si Nanowire CMOS Transistors and Circuits by Top-Down Technology Approach
    • N. Balasubramanian et al., Si Nanowire CMOS Transistors and Circuits by Top-Down Technology Approach, ECS Transactions, 13 (1), PP 201-211 (2008).
    • (2008) ECS Transactions , vol.13 , Issue.1 , pp. 201-211
    • Balasubramanian, N.1
  • 8
    • 84865583654 scopus 로고    scopus 로고
    • https://nanohub.org/resources/NANOFINFET
  • 9
    • 0029275294 scopus 로고
    • Technology CAD at AT&T
    • P. Lloyd et al., Technology CAD at AT&T, Microelectronics Journal, 26(1995), 79-97.
    • (1995) Microelectronics Journal , vol.26 , pp. 79-97
    • Lloyd, P.1
  • 10
    • 79956222016 scopus 로고    scopus 로고
    • A 1.2V High Band-Width Analog Multiplier in 0.18μm CMOS Technology
    • Ebrahimi, et al., A 1.2V High Band-Width Analog Multiplier in 0.18μm CMOS Technology, International Review of Electrical Engineering (IREE), Vol. 5 No. 2 Part B, PP 803-811, (2010).
    • (2010) International Review of Electrical Engineering (IREE) , vol.5 , Issue.2 PART B , pp. 803-811
    • Ebrahimi1
  • 13
    • 79955445300 scopus 로고    scopus 로고
    • Top-Down Fabrication of Fully CMOS-Compatible Silicon Nanowire Arrays and Their Integration into CMOS Inverters on Plastic
    • M. Lee, Y. Jeon, T. Moon, and S. Kim, Top-Down Fabrication of Fully CMOS-Compatible Silicon Nanowire Arrays and Their Integration into CMOS Inverters on Plastic, ACS-NANO, VOL. 5 NO. 4, PP 2629-2636, 2011.
    • (2011) ACS-NANO , vol.5 , Issue.4 , pp. 2629-2636
    • Lee, M.1    Jeon, Y.2    Moon, T.3    Kim, S.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.