Role of electrolyte additives during electrochemical etching of macropore arrays in low-doped silicon

Journal of the Electrochemical Society

Volumn 160, Issue 4, 2013, Pages

  Defforge, Thomas ^a   Diatta, Marianne ^a   Valente, Damien ^a   Tran Van, François ^b   Gautier, Gaël ^a  

^a UNIVERSITÉ DE TOURS   (France)

^b UNIVERSITÉ DE TOURS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CETYLTRIMETHYLAMMONIUM CHLORIDE; CHARGED MOLECULE; ELECTROLYTE ADDITIVES; ELECTROLYTIC SOLUTION; LOW-DOPED SILICON; MACRO POROUS SILICON; MACROPORE ARRAYS; SILICON ANODIZATION;

CHLORINE COMPOUNDS; ELECTROCHEMICAL ETCHING; MOLECULES; MORPHOLOGY; ORGANIC SOLVENTS; POROUS SILICON; SILICON; WETTING;

ADDITIVES;

EID: 84875721385     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/2.013306jes     Document Type: Article

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