Zinc oxide films deposited by radio frequency plasma magnetron sputtering technique

Ceramics International

Volumn 39, Issue SUPPL.1, 2013, Pages

  Hoon, Jian Wei ^a   Chan, Kah Yoong ^a   Tou, Teck Yong ^a  

^a MULTIMEDIA UNIVERSITY   (Malaysia)

Author keywords

B. Grain size; C. Optical properties; D. ZnO; RF magnetron sputtering

Indexed keywords

GRAIN SIZE; MAGNETRON-SPUTTERING DEPOSITION; RADIO FREQUENCY PLASMA; RF-MAGNETRON SPUTTERING; SURFACE PROFILOMETERS; TRANSPARENT CONDUCTIVE OXIDES; X RAY DIFFRACTOMETERS; ZNO;

ATOMIC FORCE MICROSCOPY; DEPOSITS; MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL PROPERTIES; OXIDE FILMS; SUBSTRATES; THIN FILM TRANSISTORS;

ZINC OXIDE;

EID: 84875708692     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2012.10.075     Document Type: Conference Paper

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