Gold ion implantation induced high conductivity and enhanced electron field emission properties in ultrananocrystalline diamond films

Applied Physics Letters

Volumn 102, Issue 6, 2013, Pages

  Sankaran, K J ^a   Chen, H C ^b   Sundaravel, B ^c   Lee, C Y ^a   Tai, N H ^a   Lin, I N ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b TAMKANG UNIVERSITY   (Taiwan)

^c INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED FIELD; AU NANOPARTICLE; CONDUCTION CHANNEL; ELECTRON FIELD EMISSION; ELECTRON FIELD EMISSION PROPERTIES; ELECTRON TRANSPORT; GOLD IONS; HIGH CONDUCTIVITY; ION IMPLANTED; NITROGEN-DOPED; REMARKABLE IMPACT; TURN-ON FIELD; ULTRA-NANOCRYSTALLINE DIAMOND FILMS; ULTRANANOCRYSTALLINE DIAMONDS;

CONDUCTIVE FILMS; FIELD EMISSION; GRAIN BOUNDARIES; ION IMPLANTATION; TRANSMISSION ELECTRON MICROSCOPY;

GOLD;

EID: 84874279290     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4792744     Document Type: Article

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